Nanoscale Chips Have A New Fabrication Technique Coming Their Way – ZMR News Blog

Nanoscale Chips Have A New Fabrication Technique Coming Their Way


A group of researchers has found a groundbreaking technique that can help fabricate atom-thin processors, which can have a huge impact on nanoscale chip production in labs across the world where scientists are investigating 2D materials for measly and faster semiconductors. The team led by Professor Elisa Riedo from the New York University Tandon School of Engineering has already published the study in the Nature Electronics.

It was found that the lithography could help heat the probe up to 100 degrees Celsius which outdid the conventional techniques of developing metal electrodes on 2D semiconductors like molybdenum disulfide (MoS2). The transitional metals like this can replace the silicon used in the small chips. The new technique named thermal scanning probe lithography (t-SPL) is a way to beneficial compared to electron beam lithography (EBL). In the first case, the thermal lithography advances the 2D transistors counteracting the Schottky barrier that inhibit the electrons flow at the metal’s intersection or 2D substrate. The imaging of the 2D semiconductor and the electrode patterning as per desire is also made possible using this new method. The current technique helps save money and operational costs to a greater extent.

The power consumption due to ambient condition reduces the high-energy electrons and ultra-high vacuum need. The thermal fabrication method can reach the industrial scale using the parallel thermal probes. The new researchers in the future can save a lot of time and energy. The designing of the materials and chips will receive a totally new outlook. The 3D printers will have the new tool competing it in the near future. Earlier, SwissLitho and IBM Research in collaboration had developed the thermal probes or thermal lithography for metal nano production in the City University of New York (CUNY) Graduate Center Advanced Science Research Center (ASRC) along with her colleagues.

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